Phase Retarding Mirror – Si Substrates


Phase retarding mirrors have an all-dielectric coating on a Silicon substrate. The coating has a distinct control over the relative phase between the incident and outgoing waves. They are intended for use with Carbon Dioxide lasers operating at 10.6 um. Retardation of 45° changes a linearly polarized input to a circularly polarized output. This will provide improved beam focusing capability. If a given state of polarization must be maintained throughout an optical chain, then 0° retardation mirrors should be selected. These will not change the state of polarization of the incoming beam on reflection. To rotate the plane of linear polarization by 90° choose the 90° phase retardation mirrors. These mirrors are intended for use at 45° angle of incidence.

Material:Silicon
Design Wavelength:10.6 µm @ 45deg AOI
Surface Flatness:< λ / 20 @ 10.6 µm
Surface Quality:Side 1: < 40 / 20
Side 2: Fine Ground
Wedge:< 3 arc min
Diameter Tolerance:+0/-0.1mm
Thickness Tolerance:± 0.20 mm
Clear Aperture:> 90% of diameter
Bevel:0.3 mm (typical) x 45°
Reflectance:R> 98.5%
Retardation:0: 0° ± 3°
λ / 4: 90° ± 6°
Absorption:< 0.4%

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